Layer-by-layer assembly of nanofilms from colloidally stable amine-functionalized silica nanoparticles

Official URL: http://dx.doi.org/10.1016/j.colsurfa.2021.127615

The assembly of uniform thin films with functional silica nanoparticles (FSNPs) by the layer-by-layer (LbL) technique has been studied to provide rough, robust, and functional surfaces. Initially, monodisperse silica nanoparticles (SNPs) have been synthesized by the reverse microemulsion method. Then SNPs have been functionalized using amino silane coupling agents with various chain lengths and amine positions such as (3-aminopropyl)trimethoxy silane (APS), N-[3-(trimethoxysilyl)propyl]-N,N,N-trimethylammonium chloride (NPC), N-(6-aminohexyl)aminopropyltrimethoxy silane (AHAPS), and 3-aminopropyl(dimethyl)ethoxy silane (APDMES). The amine-functionalized silica nanoparticles have been characterized using zeta potential, Fourier Transform-Infrared Spectroscopy (FT-IR), and 1H Nuclear Magnetic Resonance (NMR) spectroscopy to prove the existence of amine groups on the silica surface. Scanning electron microscopy (SEM) images have revealed that the LbL assembled thin film coatings of FSNPs are uniform and monodisperse. The thickness measurements of the coatings have been conducted by spectroscopic ellipsometry. Water contact angle measurements were performed to analyze the alteration of surface features with functional groups. The roughness, topography, and elastic modulus of the assembled thin-film coatings were probed by atomic force microscopy (AFM). The dispersion of AHAPS-FSNPs has indicated superior colloidal stability than other FSNPs because of their secondary amines creating steric hindrance. Moreover, AHAPS-FSNPs film exhibited the lowest coating thickness and the highest elastic modulus comparing with the other FSNPS because of their crosslinking and hydrogen-bonding ability. Briefly, in this work, LbL assembly of the amine FSNPs was established by an extensive investigation to form rough and functional surfaces for many demanding applications.