Kalyoncu, İlker and Burak, Abdurrahman and Gürbüz, Yaşar (2020) A k-band 5G phased array RX channel with 3.3-dB NF and 28.5-dB Gain in 130-nm SiGe. IEEE Transactions on Circuits and Systems II: Express Briefs, 67 (12). pp. 2938-2942. ISSN 1549-7747 (Print) 1558-3791 (Online)
This is the latest version of this item.
Official URL: https://dx.doi.org/10.1109/TCSII.2020.2981174
Abstract
This brief presents a low-noise K-band phased array receive channel implemented in a 130-nm SiGe BiCMOS process. The IC consists of a cascode LNA, a vector modulator phase shifter (PS), and a current-steering VGA. The LNA employs a shunt inductor at the intermediate node of the cascode for noise reduction purposes. The PS generates I/Q signals by lumped quadrature hybrids for low noise operation. Various process compensation capabilities are employed within the PS to reliably achieve high resolution. The measured results demonstrated a peak gain of 28.5 dB at 24 GHz with a 3-dB bandwidth of 22-27 GHz. The measured noise figure is 3.3 dB, which is better than state-of-the-art among Si-based phased-array channels. For 6-b phase control, the rms phase error is 4° and 0.2° without and with calibration, respectively; the rms gain error being 1 dB for both cases. For 4-b gain control with 0.4-dB/step, the rms amplitude/phase errors are 0.1-dB/0.5°. Across different phase settings, the IC has an OP1dB of -2 to -3 dBm, with a power consumption of 48 mW. The total chip area is 1.33 mm2, excluding the pads.
Item Type: | Article |
---|---|
Uncontrolled Keywords: | 5G; noise figure; phased array; receiver; SiGe |
Divisions: | Faculty of Engineering and Natural Sciences |
Depositing User: | Yaşar Gürbüz |
Date Deposited: | 04 Aug 2023 15:41 |
Last Modified: | 04 Aug 2023 15:41 |
URI: | https://research.sabanciuniv.edu/id/eprint/46926 |
Available Versions of this Item
-
A k-band 5G phased array RX channel with 3.3-dB NF and 28.5-dB gain in 130-nm SiGe. (deposited 17 Sep 2020 19:47)
- A k-band 5G phased array RX channel with 3.3-dB NF and 28.5-dB Gain in 130-nm SiGe. (deposited 04 Aug 2023 15:41) [Currently Displayed]