Magnetoelectrical properties of W doped ZnO thin films

Can, Musa Mutlu and Fırat, Tezer and Shah, S. Ismat (2012) Magnetoelectrical properties of W doped ZnO thin films. Journal of Magnetism and Magnetic Materials, 324 (23). pp. 4054-4060. ISSN 0304-8853

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ZnO thin films were deposited on the Si(100) substrate by rf sputtering using a 99.999% pure commercially bought and a home made target under 100 W power. The home made ZnO target, including 1-2% tungsten, was synthesized via solid state reaction. Thin films were deposited under a flow of 70% argon and 30% O-2 gas mixture followed by post-deposition annealing under 1 Torr oxygen atmosphere. Both deposition and post-deposition annealing were done at 420 +/- 1 degrees C. The structural analyses show that the films were in the [0002] preferred direction and that W atoms are bound to the oxygen atoms by replacing the Zn host atoms. Although no specific change was observed in the magnetic properties as a result of W doping, significant changes in the electrical properties were observed, as determined by the longitudinal and transversal magneto-electrical measurements. It was found that the W impurities induce better insulating properties due to lower carrier concentration and higher resistivity values. On the other hand, the enhanced positive magnetoresistivity and the existence of polarized spin currents, which were not specific for pure ZnO thin films, were observed in W doped ZnO films below 10 K.
Item Type: Article
Uncontrolled Keywords: Polarized spin current; W doped ZnO thin film; Anomalous Hall measurement; Magnetoresistivity
Subjects: Q Science > QC Physics
Divisions: Sabancı University Nanotechnology Research and Application Center
Faculty of Engineering and Natural Sciences
Depositing User: Musa Mutlu Can
Date Deposited: 18 Oct 2012 11:36
Last Modified: 31 Jul 2019 11:32

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