Deposition conditions and electrical and optical properties of ZITO thin films

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Amorphous ZITO films were deposited by dc magnetron sputtering onto glass substrates from ceramic oxide targets containing Zn:In:Sn cation ratios of 1:2:1 and 1:2:1.5. The microstructure, carrier density, mobility, and resistivity of as-deposited and annealed samples were evaluated using x-ray diffraction and Hall Effect measurements. The as-deposited films were amorphous and remained so after annealing at 200C in air for up to five hours. Transmissivity of the films exceeded 80% in the visible spectral region. The minimum resistivity value (7.6x10-4 -cm) was obtained from thin films deposited using the 1:2:1 composition target and a substrate temperature of 300ºC.