Self induced crystallinity in RF magnetron sputtered ZnO thin films

Özen, I. and Gülgün, Mehmet Ali and Özcan, Meriç (2004) Self induced crystallinity in RF magnetron sputtered ZnO thin films. Key Engineering Materials, 264-268 . pp. 1225-1228. ISSN 1013-9826

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ZnO films were coated on the order of micrometer thickness on various substrates using RF magnetron sputtering. Glass, mica and Si were used as amorphous and crystalline substrates to study film growth. X-ray diffraction measurements revealed a self-induced, (002) oriented texture on all substrates. Effects of residual stresses on growth behavior and possible mechanisms of textured crystallization on crystalline and amorphous substrates are discussed.

Item Type:Article
Additional Information:Conference Information: 8th Conference of the European-Ceramic-Society Istanbul, TURKEY, JUN 29-JUL 03, 2003 Turkish Ceram Soc; European Ceram Soc
Uncontrolled Keywords:ZnO; thin films; RF magnetron sputtering; crystallinity; epitaxy
Subjects:Q Science > Q Science (General)
ID Code:478
Deposited By:Meriç Özcan
Deposited On:20 Feb 2007 02:00
Last Modified:22 Oct 2019 15:25

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