title   
  

Chemical analysis of graphene oxide films after heat and chemical treatments by X-ray photoelectron and Micro-Raman spectroscopy

Dongxing, Yang and Velamakanni, Aruna and Bozoklu, Gülay and Park, Sungjin and Stoller, Meryl and Piner, Richard D. and Stankovich, Sasha and Jung, Inhwa and Field, Daniel A. and Ventrice, Carl A., Jr. and Ruoff, Rodney S. (2009) Chemical analysis of graphene oxide films after heat and chemical treatments by X-ray photoelectron and Micro-Raman spectroscopy. Carbon, 47 (1). pp. 145-152. ISSN 0008-6223

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Official URL: http://dx.doi.org/10.1016/j.carbon.2008.09.045

Abstract

Several nanometer-thick graphene oxide films deposited on silicon nitride-on silicon substrates were exposed to nine different heat treatments (three in Argon, three in Argon and Hydrogen, and three in ultra-high vacuum), and also a film was held at 70 degrees C while being exposed to a vapor from hydrazine monohydrate. The films were characterized with atomic force microscopy to obtain local thickness and variation in thickness over extended regions. X-ray photoelectron spectroscopy was used to measure significant reduction of the oxygen content of the films; heating in ultra-high vacuum was particularly effective. The overtone region of the Raman spectrum was used, for the first time, to provide a "fingerprint" of changing oxygen content.

Item Type:Article
Subjects:Q Science > QD Chemistry > QD450-801 Physical and theoretical chemistry
T Technology > TA Engineering (General). Civil engineering (General) > TA401-492 Materials of engineering and construction. Mechanics of materials
ID Code:14060
Deposited By:Gülay Bozoklu
Deposited On:23 Jun 2010 11:03
Last Modified:25 May 2011 14:01

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