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Deposition conditions and electrical and optical properties of ZITO thin films

Ow-Yang, Cleva W. and Yeom, Hyo-Young and Yağlıoğlu, Burağ and Paine, David C. (2006) Deposition conditions and electrical and optical properties of ZITO thin films. In: Materials Research Society Fall 2005 Meeting, Boston, Massachusetts/USA

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Abstract

Amorphous ZITO films were deposited by dc magnetron sputtering onto glass substrates from ceramic oxide targets containing Zn:In:Sn cation ratios of 1:2:1 and 1:2:1.5. The microstructure, carrier density, mobility, and resistivity of as-deposited and annealed samples were evaluated using x-ray diffraction and Hall Effect measurements. The as-deposited films were amorphous and remained so after annealing at 200C in air for up to five hours. Transmissivity of the films exceeded 80% in the visible spectral region. The minimum resistivity value (7.6x10-4 -cm) was obtained from thin films deposited using the 1:2:1 composition target and a substrate temperature of 300ºC.

Item Type:Papers in Conference Proceedings
Subjects:Q Science > QC Physics
ID Code:1355
Deposited By:Cleva W. Ow-Yang
Deposited On:19 Dec 2006 02:00
Last Modified:21 Sep 2010 14:39

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